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Page 235 text:
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Page 236 text:
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A. I. H. E. A.l.C.E 230 The A. l. Ch. E., founded at the Unlversity of Detroit in 1936, is open to all chemical engineers. Included in its dual purpose, supplementing of class work by providing talks and discussions on pertinent subiects and, secondly, promoting friendships between faculty and students in the chemical engineering department, has been responsible for making the society at U of D one of the leaders of the national group. Some of the annual activities of the American Institute of Chemical Engineers are a banquet honor- ing the organization's graduating seniors and a large participation in the tri-annual Engineering Show. The university chapter of the A.l.C.E. boasts a loyal and active membership that contributes much to the department of civil engineering at the University of Detroit. The tours, lectures, and discussions of this organization display a high degree of correlation with classroom material. Extra-curricular research is also encouraged. As a result of planned programs, contacts with professional civil engineers are created. The student engineer is informed of post-graduate requirements and standards, and in this way the student is prepared for problems that he will encounter after graduation. Social meetings are also provided by the Chapter and each member is encouraged to participate in extra activities. The local chapter of the National A.l.E.E. was formed at the University of Detroit in l945. Estab- lishing an important link between industry and the classroom, this organization serves as a valuable aid in the theoretical, practical, and professional develop- ment of the student in all aspects of electrical engi- neerlng, and of the allied arts and sciences. The maintenance of a high professional attitude in its members is stressed as well as the development of the individual engineer. Meetings, centered around prominent speakers from the engineering field, and industrial tours aid in this development. Opportunity is given the elec- trical students to enter technical papers in the National A.I.E.E. Student Paper competition. ln addition, social meetings and activities for the members are sponsored. First row, J. L. Dietz, J. G. Macy, C. D. Wutkiewicz, vice-president, C. R. Wagner, J, A. Bieke, corresponding secretary, C. T. Rodziewicz. Second row: Prof. L. S. Kowalczyk, P. C. Finn, P. A. Felscianos, E. J. Ciepiela, E. J. Altermatf. Third row: J. Yaeger, J. Maloney, E. P. Durkin, R. J. Reuter, H. T. Rocheleau, Prof. H. C. Gudebski, moderator. Fourth row: R. R. Yadach, W. G. Neal, E. Forster, R. J. Amport, R. T. McEvoy, M. Talik, R. Slepetys. Front Row: Fuhair Kazanji, vice-president, Richard Werling, Larry Richards, presi- dent, Dan Shanahan, Mike Groen, Clar- ence Mueller, Mark Klosterman, Ken Bradford. Second Row: Thomas Cavanaugh, Peter Bruski, Jacob Hurick, Francis Padke, AI Moliassa, Mike McGinnis, Sam Williams, Charles Pierce, Ray Lablanc. Standing: Victor Beck, Jack Covert, Bill Eckstein, Don Thrasher, Russell Carniak, Gus Gavit, Bud Mielock, John Mooney, Robert Fitzer, Jerry Powers, Paul Weckes- ser, James Guiry, James Peters, Wm. Peters, Geo. Wilhelmi, Larry Martin, secre- tary, Tom Hunt, Jack Cain, treasurer, Rudy Gross, Ray Baginski, Wm. Kasip. First row: Martin Wyrod, president, Byron Warner, vice-president, Prof. R. Ahlquist, faculty moderator, Prof. G. M. Chute. Second row: Harry Koester, corresponding secretary, William Wyess, recording secre- tary, John Conklin, treasurer, Eugene N. Schalk, secretary. Third row, Albert Vanschaernelhout, Richard R. Secunde, William B. Williams. Fourth row: Gerald Freda, Sam J. Cris- centi, Gordon J. Webster, Ed Halas. Standing: William B. Johns, Peter P. Dusina, William J. Hughes, Larry R. Hogan, Fred Labadie, Francis X. Beeden- bender.
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